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TEL Clean Track MARK8Z Coater / Developer - VERKAUFT

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Hersteller und Modell: TEL Clean Track MARK8Z
Positionsnummer: 47 | Objekt ID: smi82908 | Inventarnummer: EU313834
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Beschreibung: Tool code PAT23 For configuration sheet Click HEREConfiguration
Process COAT/DEVE
WAFER SPECIFICATION
Wafer Size 200MM
Wafer Shape SNNF (Semi Notch No Flat)
Wafer Cassette 8” PP Miraial
SYSTEM CONFIGURATION
Process Block 2
Coater head# 2
Develop head# 2
Adhesion Chamber# 2
Hot Plate# 7
Cooling Plate# 7
WEE# 1
IFB
Chemical Box (HMDS/Solvent/NMDW) 1
Cup T&H Control 1
Carrier Station
Stage 1×4 Side Loading (Sender /Receiver or Uni - cassette)
Coater
Nozzle# 2-1:4 2-2:2
Resist temperature Control Multi
Coater Cup PP+PPS with Mist trap
Spin chuck PEEK
Resist Pump F/T200-1 RRC Pump
Back rinse Flow meter Max range 150ml/min with flow sensor
Solvent Bath Flow meter Max range 50ml/min with flow sensor
EBR Flow meter Max range 20ml/min
RRC Nozzle Flow meter Max range 150ml/min
Drain Central
Motor Flange temp control 1
Solvent solution supply Central supply
Developer
Nozzle E Square Nozzle
Develop solution supply Central supply
Developer Cup FR-PP + PPS with Mist trap
Spin chuck PEEK
E Square Nozzle Flow meter Max range 3.0l/min with flow sensor
Rinse Nozzle Flow meter Max range 2.0l/min with flow sensor
Back Rinse Flow meter Max range 150ml/min with flow sensor
Develop temperature control 15-50deg by 0.1deg pitch
Drain Central
Motor Flange temp control 1
Note the above information is for guidance only. Changes to configuration might have been made
Anzahl: Verfügbarkeitsanfrage
Seriennummer: 816773
Baujahr: 1996
Standort: Nishiwaki, Japan
Besichtigung: Nach vorheriger Vereinbarung
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Kontaktdaten
Kontakt: Andy Hackett
Land: Großbritannien
Telefon: +44 (0)7764 308 689
Kontakt: Eric Zhang
Telefon: +86 21 62726246 801
Telefon 2: +86 139 1795 6751
Kontakt: Yusuke Uchiyama
Telefon: +81 (0)904 422 9392
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